![]() Google Patents Dual damascene process flow for a deep sub-micron technologyÄownload PDF Info Publication number US6211069B1 US6211069B1 US09/312,601 US31260199A US6211069B1 US 6211069 B1 US6211069 B1 US 6211069B1 US 31260199 A US31260199 A US 31260199A US 6211069 B1 US6211069 B1 US 6211069B1 Authority US United States Prior art keywords opening layer silicon oxide dual damascene oxide layer Prior art date Legal status (The legal status is an assumption and is not a legal conclusion. Google Patents US6211069B1 - Dual damascene process flow for a deep sub-micron technology US6211069B1 - Dual damascene process flow for a deep sub-micron technology ![]()
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